Model | - Agilent Technologies, 2015 - Agilent 7900 ICP-MS |
---|---|
Operating time | 09:00 ~ 18:00 |
Location | C177, ICP-MS |
inquiry |
1. 장비명 : 유도 결합 플라즈마 질량분석기
Inductively Coupled Plasma Mass Spectrometer (ICP-MS)
2. 제조사 및 모델명 :
- Agilent Technologies, 2015
- Agilent 7900 ICP-MS
3. 장비 목적 :
ICP-MS is used to analyze trace impurities of various materials for low background research. The impurity levels before and after purification or crystal growth are evaluated mainly for the materials of single crystal growth. The main measurement elements are K, Sr, Ba, Pb, Th, U.
4. 주요 구성 및 성능 :
Instrument Performance |
|
| |
Sensitivity (Mcps/ppm) | 89Y | 600 | |
205Tl | 520 | ||
238U | 720 | ||
Background | m/z 9 | <0.3 cps | |
Detection limits | 9Be | <0.05 ppt | |
115In | <0.02 ppt | ||
209Bi | <0.02 ppt | ||
Oxide | CeO/Ce | <1.8% | |
Doubly charged | Ce2+/Ce | <2.5% | |
Stability | 20 min | <1.0% RSD | |
2 hr | <1.2% RSD |
Specifications |
|
|
Sample Introduction System | Peristaltic pump | 10-roller, 3 channels |
Spray chamber | –5 °C to +20 °C | |
Ultra High Matrix Introduction system (UHMI) | ||
Plasma | RF generator | 27Mhz 500Wto1600W |
OctopoleReactionSystem (ORS) | He (collision) cell gas line | Included |
H2 (reaction) cell gas line | Optional | |
3rdcellgasline (low-orhigh-flowrate) | Optional | |
Mass analyzer | Mass range | 2–260 u |
Mass resolution | Variable from 0.3 u to 1.0 u | |
Detector | Dynamic range | 11orders (0.1cpsto10Gcps) |
Minimum integration time | 100 μs |
5. 장치 위치 및 사진 :
- C177, ICP-MS