Model | - Samco Inc. 2018 - model PD-100ST |
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Operating time | 09:00 ~ 18:00 |
Location | IBS HQ C169 clean room 1000 (deposition room) |
inquiry |
1. Equipment name : Low temperature PECVD (저온플라즈마 화학기상증착장비)
2. Manufacture and Model
- Samco Inc. 2018
- model PD-100ST
3. Purpose : This equipment is used to measurement for low temperature detectors. It utilize a liquid TEOS source o deposit SiO2 films at hogh speed using a low temperature process. Furthermore, the proprietary self-bias deposition of thin and thick films with low internal stress.
4. Specification and performance
- Main Chamber
: STS304
: cylindrical Φ = 260.6 mm
: Maximum 4 inch wafer
: view port for visual confirmation of plasma
: chamber lid opens and closes manually
- Electrodes
: parallel plate (capacitive coupling)
: fixed gap between electrodes: 29 mm
- Resistive heater : Max. 300 ℃
- PID controlled resistive heater : Max. 350 ℃
- PID controlled RF Generator
: 13.56 MHz
: Max. 300 W
: crystal oscillation
: all solid state
- Matching Unit
: automatic matching
- Liquid Source Line
: the flow rate of the vaporized liquid source is directly controlled
: source tank
: source tank heating (75-85 ℃)
: gas flow control
: gas inlet valve :: bellows seal valve (air operated)
: protection to over heat problems
- Process Gas Lines
- Vacuum Gauge
- Process Vacuum Line
: Dry pump (2000 liter/min at 50/60 Hz)
- Pressure Control
: automatic pressure control (variable evacuation conductance)
- System Control
: automatic operation via programmable logic controller
5. Location and Picture :
- IBS head quarter, C169 clean room 1000 (deposition room)