Center for Multidimensional Carbon Materials

High-quality BeO films fabricated using discrete feeding plasma-enhanced atomic layer deposition

Bae Jonghyun, Chae Juyoung, Jang Yoonseo, Jung Dohwan, Han Sangoh, Sultane Prakash R., Bielawski Christopher W., Oh Jungwoo [Ceramics International (2025)]

Surface reconstructions in thin films of magnetic topological insulator MnBi2 Te4

Sattar Shahid, Hedman Daniel, Canali C.M. [Physical Review Research 7, 2(2025)]

Interfacial Spin–Orbit-Coupling-Induced Strong Spin-to-Charge Conversion at an All-Oxide Ferromagnetic/Quasi-Two-Dimensional Electron Gas Interface

Mi-Jin Jin, Yang Guang, Um Doo-Seung, Linder Jacob, Robinson Jason W.A. [ACS Applied Materials & Interfaces 17, 12, 19026-19032(2025)]

High-Performance Oxide Thin-Film Transistors with Atomic Layer Deposition-Grown HfO2/BeO Hetero-Dielectric

Lee Sein, Jang Yoonseo, Ham Wooho, Bae Jonghyun, Kim Kyunghwan, Park Jeong-Min, Lee Junseo, Song Min-Kyu, Jung Dohwan, Sultane Prakash R., Han Jae-Hoon, Bielawski Christopher W., Oh Jungwoo, Kwon Jang-Yeon [Nano Letters 25, 17, 6975-6982(2025)]

Dynamics of a light-driven molecular rotary motor in an optical cavity

Lee In Seong, Filatov Michael, Min Seung Kyu [Nature Communications 16, 1(2025)]

A Phosphoramide-Based Electrolyte with High Affinity towards Li+ and Low Polysulfide Solubility Enables High-Performance Lithium–Sulfur Batteries

Ren Jie, Sun Congkai, Gong Wenbin, Zhou Ji, Chen Shang, Wang Manyun, Bielawski Christopher W., Geng Jianxin [Chemical Engineering Journal 514(2025)]

Recent Developments in DFTB+, a Software Package for Efficient Atomistic Quantum Mechanical Simulations

Hourahine B., Berdakin M., Bich J.A., Bonafé F.P., Camacho C., Cui Q., Deshaye M.Y., Díaz Mirón G., Ehlert S., Elstner M., Frauenheim T., Goldman N., González León R.A., van der Heide T., Irle S., Kowalczyk T., Kubař T., Lee I.S., Lien-Medrano C.R., Maryewski A., Melson T., Min S.K., Niehaus T., Niklasson A.M.N., Pecchia A., Reuter K., Sánchez C.G., Scheurer C., Sentef M.A., Stishenko P.V., Vuong V.Q., Aradi B. [Journal of Physical Chemistry A 129, 24, 5373-5390(2025)]

Impact of CF4 plasma etching on defect formation and material properties of Al2O3 thin films

An Yu-Bin, Ryu Da-Won, Ma Seung-Hyun, Lee Dong-Geon, Jin Mi-Jin, Um Doo-Seung, Kim Chang-Il [PHYSICA SCRIPTA 100, 6(2025)]