To explore new physics phenomena of low dimensional materials
with a special emphasis on two-dimensional layered structures
Model | Customized |
---|---|
Operating time |
MON(00:00~24:00) TUE(00:00~24:00) WED(00:00~24:00) THU(00:00~24:00) FRI(00:00~24:00) |
Location | 86591 |
inquiry |
Sanghyub Lee 010-6769-3746 tkdguq91@skku.edu |
ㅡInformationㅡ
TCVD is used for device annealing in atmosphere pressure. Temperature variation is from 25 degree to 1000 degree Celsius. Both Argon and Hydrogen can be flowed in the chamber.