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To explore new physics phenomena of low dimensional materials
with a special emphasis on two-dimensional layered structures
Ebeam lithography
| Model | Customized |
|---|---|
| Operating time |
SUN(00:00~24:00) MON(00:00~24:00) TUE(00:00~24:00) WED(00:00~24:00) THU(00:00~24:00) FRI(00:00~24:00) SAT(00:00~24:00) |
| Location | 86698 |
| inquiry |
Tuan Dung 010-9486-2804 dungnt@skku.edu |
Notice
Only assigned operators can use this machine 3 hour use will be maximum
Available Time // 09:00~24:00 on every day.
Current status // Now on operation
E-beam lithography system is used to pattern micro/sub-micro structure
Magnification: X5-300,000 / resolution: 3.0nm
Specimen Size: Up to 150mm(diameter) / Accelerating Voltage: 0.5-30kV
Electron Gun: W Hairpin Filament / User interface: PC/AT Compatible/Windows Vista
Observation Monitor: 19" LCD Monitor / Ethernet: Connectable
Analytical Functions: EDS,WDS / Evacuation Sys: TMP+RP
IBS Center for Integrated Nanostructure Physics , Office 86371, N Center (BIdg. 86)Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do
Copyright(c) 2014 Center for Integrated Nanostructure Physics at IBS. All Rights Reserved.
