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To explore new physics phenomena of low dimensional materials
with a special emphasis on two-dimensional layered structures
ALD(Clean room)
| Model | Lucida D100 |
|---|---|
| Operating time |
SUN(00:00~24:00) MON(00:00~24:00) TUE(00:00~24:00) WED(00:00~24:00) THU(00:00~24:00) FRI(00:00~24:00) SAT(00:00~24:00) |
| Location | 86698 |
| inquiry |
Byeonghoon Lee 010-9075-5107 zxvpwr7@naver.com |
* This equipment is in clean room *
Available Time // Except 12:00~18:00 on Mon~Thur.
Notice // If you want to have training for using this equipment, please contact Super-user.
Current Status // Now on operation.
ALD is an equipment used for thin film deposition. Since we can control film thickness in atomic scale, this is inevitable in nanoscience and semiconductor science.
Material: TMA(Aluminum precursor), TEMAHf(Hafnium precursor)
Substrate size: 100~200[mm]
Substrate temperature: 300[K]~620[K](±0.2K) at 1[Torr], in wafer
Precursor Sources: 3, heated 2 sources and H2O source
Deposition Uniformity : <±2[%]
IBS Center for Integrated Nanostructure Physics , Office 86371, N Center (BIdg. 86)Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do
Copyright(c) 2014 Center for Integrated Nanostructure Physics at IBS. All Rights Reserved.
