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To explore new physics phenomena of low dimensional materials
with a special emphasis on two-dimensional layered structures
Mask aligner
| Model | MA6 SUSS |
|---|---|
| Operating time |
SUN(00:00~24:00) MON(00:00~24:00) TUE(00:00~24:00) WED(00:00~24:00) THU(00:00~24:00) FRI(00:00~24:00) SAT(00:00~24:00) |
| Location | 86698 |
| inquiry |
Ryu JungHyun 010-3706-4726 |
Notice
* This equipment is in clean room *
Available Time // Always possible.
Notice // If you want to have training for using this equipment please contact Super-user.
Current Status // Now on operation.
This equipment is lithography tool with exposure system.
It is for adjustment a glass mask to a wafer with submicron precision.
1. Top side Alignment Bottom side Alignment
2. IR alignment
3. Maximum substrate Size : 6“x6“
4. Accurate and precise gap setting for high yield
5. Parameter storage saves set-up time and improves process consistency
6. High-quality diffraction reducing exposure optics : For high resolution and optimum edge quality
7. High intensity light sources reduce process time
8. UV 400 UV300 UV 250 UV 200(Excimer laser)
9. Upgradable with retrofit kits for Nano Imprint Lithography (NIL)
10. Offers a large variety of options
IBS Center for Integrated Nanostructure Physics , Office 86371, N Center (BIdg. 86)Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do
Copyright(c) 2014 Center for Integrated Nanostructure Physics at IBS. All Rights Reserved.
