To explore new physics phenomena of low dimensional materials
with a special emphasis on two-dimensional layered structures
Model | Customized |
---|---|
Operating time |
SUN(00:00~24:00) MON(00:00~24:00) TUE(00:00~24:00) WED(00:00~24:00) THU(00:00~24:00) FRI(00:00~24:00) SAT(00:00~24:00) |
Location | 86698 |
inquiry |
Hyeonbeom Kim 010-4670-5296 hyeonbeom0624@gmail.com |
Available Time // All days available.
Notice // If you want education for using this equipment, please contact Super-user.
Current Status // Now on operation.
Advanced Physical Vapor Deposition process development tool
■ System Performance
1. Film thickness uniformity < ±5% in 2inch area
2. Deposition control: Thickness monitor(1ch)
■ System Specification
=== Vacuum chamber ===
1. Material : Electro-polished 304 stainless steel
2. Chamber shape : Welded front door box type
3. Top plate : Substrate module mount
4. Bottom plate: Thermal source mount
=== Vacuum Control ===
1. Rotary vane pump : 200 L/min or more
2. Turbo Molecular pump : User supplied
3. Pumping line vacuum gauge : T/C Gauge
4. Chamber vacuum gauge: Hot cathode ion gauge sensor high vacuum
=== Substrate Module ===
1. Sample Size : 2" single wafer
2. Sample condition: Water cooling type
=== Deposition Module ===
1. Resistance heater & Power supply: Tungsten boat 10(w) x 100(L) & 2kW(5V,400A) (2set)
2. Thickness control: 1ch control
=== Desktop Frame ===
1. Structure
- Non-Electrostatic painted iron frame
- Easily movable foot master
2. Installation
- Vacuum Chamber /Pumping units
- Touch Panel
- PLC & Electric board
- Main Power / Emergency switch
=== System Control ===
1. Operation: Semi auto control by Touch Panel
2. Safety: Alarm & Interlock