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To explore new physics phenomena of low dimensional materials
with a special emphasis on two-dimensional layered structures
Rapid Thermal Processing System (순간 열처리 시스템)
| Model | RTP-1300 |
|---|---|
| Operating time |
SUN(00:00~24:00) MON(00:00~24:00) TUE(00:00~24:00) WED(00:00~24:00) THU(00:00~24:00) FRI(00:00~24:00) SAT(00:00~24:00) |
| Location | 86391 |
| inquiry |
Hyunyong Song 010-9193-4035 |
Notice
Available Time // Always possible.
Notice // If you want to have training for using this equipment, please contact Super-user.
Current Status // Now on operation.
Rapid thermal annealing system
Film or small sample only for short period
(less than 10 min.)
1. Temp. : Max 1200 [°C]
2. Raising temp speed : 50~80 [°C/sec.]
3. Measurable sample size: 4 [inch] wafer
4. weight: Apprx 57[kg]
5. size: Apprx 50 x 70 x 58[cm]
6. Electricity: 220[V], 3 [phase]
7. Power supply: Max 43[A], current rage 39[A].
8. Heating lamp: hallogen lamp. 12 Nos. 1.5[kw] each.
9. Cooling system by Water
10. Gas flow port for Gas purge(N2/Ar/O2and etc) in and out.
11. Vacuum status: Max 10-3 [Torr]
12 . K type thermocouple.
13. susceptor: transparent quartz.
IBS Center for Integrated Nanostructure Physics , Office 86371, N Center (BIdg. 86)Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do
Copyright(c) 2014 Center for Integrated Nanostructure Physics at IBS. All Rights Reserved.
