Device fabrication > Equipment > Public

To explore new physics phenomena of low dimensional materials
with a special emphasis on two-dimensional layered structures

equipment explanation
Model	JSM-IT200
Operating time	SUN(00:00~24:00) MON(00:00~24:00) TUE(00:00~24:00) WED(00:00~24:00) THU(00:00~24:00) FRI(00:00~24:00) SAT(00:00~24:00)
Location	86698
inquiry	Minjeong Kim 010-5561-2463 fkfkfkfkfk98@naver.com

Reservation

Only assigned operators can use this machine 3 hour use will be maximum

Available Time // 09:00~24:00 on every day.

System descriptions :

E-beam lithography system is used to pattern micro/sub-micro structure

System specifications :

Resolution High vacuum mode : 3.0nm (30kV), 8.0nm(3kV), 15.0nm (1.0kV)

Direct magnification : x5 to 300,000

Electron gun : W filament, Fully automatic gun alignment

Accelerating voltage : 0.5 to 30kV

Probe current : 1 pA to 0.3 μA*5

Objective lens aperture : 1-stage, with XY fine adjustment function

Automatic functions : Filament adjustment, Gun alignment, (Focus /Stigmator /Brightness /Contrast)

Maximum specimen size : 150 mm dia. × 48 mm (H)

Specimen stage : XY-2 axes motor-drive eucentric stage X: 80 mm, Y: 40 mm, Z: 5 to 48 mm Tilt: –10 to 90°, Rotation: 360°

Observation monitor : 24-inch touch panel

Vacuum system : Fully automatic, TMP: 1 RP: 1

Center for Integrated Nanostructure Physics